Monocrystalline silicon wafer specifically engineered for infrared applications, ensuring optimal functionality in IR detectors and cameras. Versatile size range from 25mm to 105mm with a consistent thickness of 0.5mm, ideal for a variety of optical configurations. Exceptional dimensional tolerance of +/-0.02mm guarantees precision for critical optical engineering tasks and applications. Features a λ/10 face shape and parallelism of +/-30'', providing superior optical clarity and alignment for advanced imaging systems. Custom coating options including AR and BBAR enhance light transmission and minimize reflections, tailored to meet your specific optical requirements.
Monocrystalline silicon wafer specifically engineered for infrared applications, ensuring optimal functionality in IR detectors and cameras. Versatile size range from 25mm to 105mm with a consistent thickness of 0.5mm, ideal for a variety of optical configurations. Exceptional dimensional tolerance of +/-0.02mm guarantees precision for critical optical engineering tasks and applications. Features a λ/10 face shape and parallelism of +/-30'', providing superior optical clarity and alignment for advanced imaging systems. Custom coating options including AR and BBAR enhance light transmission and minimize reflections, tailored to meet your specific optical requirements.
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